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The Q300T T Plus is a large chamber, turbo-pumped coating system, ideally suited for sputtering a single large diameter specimen up to 8″/200mm or multiple smaller specimens over a similar diameter. Ideal for thin-film applications and SEM/FE-SEM. It is fitted with three sputtering heads to ensure even deposition of individual large specimens or multiple specimens.
NB: Please note it is not possible to sequentially sputter three different sputtering metals from each sputtering head – for sequential coating see the Q300T D Plus.
These products are for Research Use Only.
Removable glass chamber and easily accessible base and top plate allows for an easy cleaning process.
Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples.
Tall chamber option is available for improved uniformity for sputtering and to hold larger substrates.
The Q300T T Plus is fitted with three individual sputtering heads to ensure even deposition of individual large specimens or multiple specimens. For economical coating of small specimens, ‘single target’ mode can be selected. They are ideal coaters for the preparation of large specimens for examination by SEM, FEG-SEM. To ensure even deposition, the Q300 Plus series of coaters are fitted with a rotating specimen stage and three individual magnetron target assemblies, which enhance the efficiency of the process by using low voltages.
The Q300T T Plus has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and the rotation speed is variable between pre-set limits.
Flat rotation stage for 200 mm/8” and 150 mm/6” wafers (fitted as standard).
The Q300T T Plus meets key industry CE standards
• All electronic components are protected by covers
• Implosion guard prevents user injury in event of chamber failure
• Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened
• Overheating protection shuts down power supply
High vacuum turbo pumping allows sputtering of a wide range of oxidising and non-oxidising metals for thin film and electron microscopy applications. Automatic vacuum control which can be pre-programmed to suit the process and material, therefore removing the need for manual intervention or control.
Sputter coating is a technique widely used in various applications; it is possible to create a plasma and sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for electron microscopy applications because it can heat the sample and result in damage when the plasma interacts with the sample. The Q series uses low temperature enhanced-plasma magnetrons optimised for the turbomolecular pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.
The Q300T T Plus uses easy-change, 57 mm diameter, disc-style targets which are designed to sputter oxidising and noble metals. The Q300T T Plus is fitted as standard with a chromium (Cr) sputter target. Other targets options include; Au, Au/Pd, Pt/Pd, Pd, Pt, Cu, Ir, W, ITO and Al etc.
Aluminium (Al) rapidly forms an oxide layer which can be difficult to remove. The Q300T T Plus has a special recipe for aluminium that reduces the oxide removal time and prevents excessive pre-sputtering of the target.
Film thickness monitor
The Q300T T Plus can be fitted with an optional film thickness monitor (FTM), which measures the coating thickness on a quartz crystal monitor within the chamber, in order to control the coating thickness of material deposited on to the sample.
590mm W x 535mm D x 420mm H (maximum height during the opening of the coating head: 772mm)
36 kg (packed: 59kg)
730 mm W x 630 mm D x 690 mm H
Borosilicate glass with integral PET implosion guard Size 300 mm outside diameter x 127 mm High
115.5mm W x 86.4mm H (active area), 640 RGB x 480 (display format), capacitive touch colour display
Full graphical interface with touch screen buttons, includes features such as a log of the last 1000 coatings and reminders for when maintenance is due
A flat rotation stage for 6”(150mm) and 8” (200mm) wafers is fitted as standard.
A rotating/tilt stage and the ‘rota cota’ rotary tilt stage are also options
Rotary pump: Rotary pump – 4 m3/hr, two stage rotary pump with oil mist filter for the Q300T T Plus
Turbo pump: Turbo pump – Internally mounted 70L/sec air cooled
Vacuum Measurement: Pirani gauge as standard, wider range gauge available as an option
Ultimate vacuum: 5 x 10-5mbar*
Sputter vacuum range: 5×10-2 to 5×10-3 mbar*
*Typical ultimate vacuum of the pumping system in a clean instrument after pre-pumping and venting with dry nitrogen gas
Sputter Deposition Current:
Single target: 1 – 150mA
All targets: 60 – 420mA
A large status multi-colour indicator light provides a visual indication of the state of the equipment, allowing users to easily identify the status of a process at distance.
The indicator LED shows the following states:
• Initialisation
• Process running
• Idle
• Coating in progress
• Process completed
• Process ended in fault condition
Audio indication also sounds on completion of the process.
Gases: process gas argon, 99.999% Nominal 5 psi
