Ultraflat series Plasma Enhanced Chemical Vapour Deposition System (PECVD)
PECVD is the main technology used to prepare high-purity and high-performance solid films, mainly by ionising the target gas with the help of microwave or radiofrequency, to promote the chemical reaction to proceed at a lower temperature, so as to deposit the desired thin film on the substrate.
At present, the CVD equipment developed by the project team can directly grow all kinds of new two-dimensional materials represented by graphene on a variety of substrates (e.g., metal, oxide, and semiconductor surfaces) for the research and development of new materials and devices. The process is simple and cheap, and has the compatibility of the traditional semiconductor growth process.
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Ultraflat series Plasma Enhanced Chemical Vapour Deposition System (PECVD)
PECVD is the main technology used to prepare high-purity and high-performance solid films. Mainly, it works by ionising the target gas with the help of microwave or radiofrequency. In this way, it promotes the chemical reaction to proceed at a lower temperature. As a result, the desired thin film is deposited on the substrate.
At present, the CVD equipment developed by the project team can directly grow all kinds of new two-dimensional materials represented by graphene on a variety of substrates (e.g., metal, oxide, and semiconductor surfaces). This equipment is suitable for the research and development of new materials and devices. Besides, the process is simple and cheap. It also has the compatibility of the traditional semiconductor growth process.
